Dr. Daniel A. Corliss
Senior Manager Patterning Research at IBM Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (33)

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Sensors, Calibration, Scanners, Inspection, Gas lasers, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Oxides, Lithography, Etching, Metals, Dielectrics, Scanning electron microscopy, Directed self assembly, Critical dimension metrology, Tin, Back end of line

PROCEEDINGS ARTICLE | April 13, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Optical lithography, Polymethylmethacrylate, Etching, Metals, Scanning electron microscopy, Extreme ultraviolet, Directed self assembly, Picosecond phenomena, Critical dimension metrology

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Extreme ultraviolet, Directed self assembly, Plasma etching, Optical alignment, Critical dimension metrology, Line edge roughness, Nanofabrication

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Inspection, Chromium, Atomic force microscopy, Scanning electron microscopy, Printing, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 33 publications
Conference Committee Involvement (8)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 8 published special sections
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