Dr. Daniel A. Corliss
Senior Manager Patterning Research at IBM Corp
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Directed self assembly, Critical dimension metrology, Overlay metrology, Back end of line

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Polymers, Ultraviolet radiation, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Defect inspection

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Electron beam lithography, Image processing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 9 April 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 4 April 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Sensors, Calibration, Scanners, Inspection, Gas lasers, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tin

Showing 5 of 36 publications
Conference Committee Involvement (8)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 8 Conference Committees
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