Daniel Courboin
Engineering leader at Toppan Photomasks Korea Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 2 April 2011 Paper
G. Bouton, B. Connolly, D. Courboin, A. Di Giacomo, F. Gasnier, R. Lallement, D. Parker, M. Pindo, J. C. Richoilley, F. Royere, A. Rameau-Savio, M. Tissier
Proceedings Volume 7985, 79850R (2011) https://doi.org/10.1117/12.896341
KEYWORDS: Photomasks, Critical dimension metrology, Inspection, Diffractive optical elements, Optical proximity correction, Scattering, Scanning electron microscopy, Semiconducting wafers, Lithography, Manufacturing

Proceedings Article | 6 December 2004 Paper
Daniel Courboin, Jong Woo Choi, Sang Hyun Jung, Seung Hee Baek, Lee Ju Kim
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569774
KEYWORDS: Etching, Photomasks, Critical dimension metrology, Picture Archiving and Communication System, Photoresist processing, Lithography, Scanning electron microscopy, Standards development, Semiconducting wafers, Process control

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557708
KEYWORDS: Critical dimension metrology, Standards development, Photomasks, Lithography, Semiconducting wafers, Diffractive optical elements, Photoresist processing, Acoustics, Temperature metrology, Physics

Proceedings Article | 1 August 2002 Paper
Junsik Cho, Seung Hee Baek, Kyung-Han Nam, H. J. Cho, Daniel Courboin, Seong-Ho Jeong, In-Soo Lee, Cheol Shin, Hong-Seok Kim
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476943
KEYWORDS: Critical dimension metrology, Dry etching, Etching, Error analysis, Mask making, Photomasks, Optical proximity correction, Modulation, Logic devices, Scanning electron microscopy

Proceedings Article | 3 February 2000 Paper
Daniel Courboin, Philippe Gervot, Chantal Gayou, Patrick Montarou
Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377106
KEYWORDS: Critical dimension metrology, Diffractive optical elements, Photomasks, Scanning electron microscopy, Error analysis, Etching, Dry etching, Statistical analysis, Optical lithography, Photoresist processing

Showing 5 of 6 publications
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