Daniel Diehl
Director at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Amorphous silicon, Optical lithography, Etching, Silicon, Chemical vapor deposition, Photoresist materials, Silicon films, Extreme ultraviolet, Physical vapor deposition, Head-mounted displays

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Manufacturing, Reflectivity, Photoresist materials, Double patterning technology, Semiconducting wafers, System on a chip

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