Mr. Daniel I. Fiekowsky
Engineering Manager at AVI-Photomask
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Reticles, Databases, Scanners, Inspection, Feature extraction, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Opacity, Inspection, Bridges, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Reticles, Modulation, Polarization, Inspection, Scanning electron microscopy, Bridges, Photomasks, Semiconducting wafers, Classification systems

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Defect detection, Error analysis, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Wafer testing, Classification systems

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Reticles, Contamination, Scanners, Inspection, Inspection equipment, Photomasks, Semiconducting wafers, Yield improvement, Defect inspection

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