Daniel I. Fiekowsky
Engineering Manager at AVI-Photomask
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 21 April 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Reticles, Databases, Scanners, Inspection, Feature extraction, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Opacity, Inspection, Bridges, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Reticles, Modulation, Polarization, Inspection, Scanning electron microscopy, Bridges, Photomasks, Semiconducting wafers, Classification systems

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Defect detection, Error analysis, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Wafer testing, Classification systems

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Reticles, Contamination, Scanners, Inspection, Inspection equipment, Photomasks, Semiconducting wafers, Yield improvement, Defect inspection

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top