Daniel S. Fischer
Reticle Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 1 April 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Printing, Transmittance, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Data modeling, Etching, Integrated modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Data integration, Instrument modeling

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Line edge roughness, Tolerancing, Systems modeling

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Optical lithography, Data modeling, Pattern recognition, Quality measurement, Time metrology, Optical proximity correction, Target recognition, Semiconducting wafers

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Statistical analysis, Data modeling, Calibration, Error analysis, Computer simulations, Scanning electron microscopy, Optical proximity correction, Statistical modeling, Model-based design

Showing 5 of 7 publications
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