Daniel J. Golich
Sr. Manager, EUV Technology Intregration at Cymer LLC
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | June 29, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Scanners, Reflectivity, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D scanning, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Light sources, Ions, Manufacturing, Reflectivity, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Scanners, Manufacturing, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Light sources, Sensors, Ions, Coating, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Showing 5 of 8 publications
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