Mr. Daniel J. Golich Profile

Daniel J. Golich

Sr. Manager, EUV Technology Intregration at Cymer LLC

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Author

Publications (8)

SPIE Journal Paper | June 29, 2012

Development of stable extreme-ultraviolet sources for use in lithography exposure systems

Igor Fomenkov, Bruno La Fontaine, Daniel Brown, Imtiaz Ahmad, Peter Baumgart, Norbert Bowering, David Brandt, Alexander Bykanov, Silvia De Dea, Alex Ershov, Nigel Farrar, Daniel Golich, Michael Lercel, David Myers, Chirag Rajyaguru, Shailendra Srivastava, Yezheng Tao, Georgiy Vaschenko

JM3 Vol. 11 Issue 02

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

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PROCEEDINGS ARTICLE | April 7, 2011

LPP source system development for HVM

Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II

KEYWORDS: Mirrors, Scanners, Reflectivity, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D scanning, Semiconducting wafers, Plasma

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PROCEEDINGS ARTICLE | March 23, 2010

Laser-produced plasma light source for EUVL

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Mirrors, Light sources, Ions, Manufacturing, Reflectivity, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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PROCEEDINGS ARTICLE | March 20, 2010

LPP source system development for HVM

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Mirrors, Scanners, Manufacturing, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

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SPIE Journal Paper | October 1, 2009

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Norbert Böwering, Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, Dave Myers, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

JM3 Vol. 8 Issue 04

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

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PROCEEDINGS ARTICLE | March 18, 2009

Laser-produced plasma light source for EUVL

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Mirrors, Light sources, Sensors, Ions, Coating, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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PROCEEDINGS ARTICLE | March 18, 2009

LPP source system development for HVM

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Mirrors, Light sources, Scanners, Coating, Manufacturing, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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PROCEEDINGS ARTICLE | March 10, 1994

Laboratory measurements of atmospheric water vapor and aerosol absorption at 1.064 um

Proc. SPIE. 2068, Chemical, Biochemical, and Environmental Fiber Sensors V

KEYWORDS: Modulation, Aerosols, Calibration, Water, Spectral calibration, Acoustics, Atmospheric sensing, Atmospheric particles, Information operations, Absorption

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Showing 5 of 8 publications

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