Daniel J. Golich
Sr. Manager, EUV Technology Intregration at Cymer LLC
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | 29 June 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Scanners, Reflectivity, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D scanning, Semiconducting wafers, Plasma

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Light sources, Ions, Manufacturing, Reflectivity, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Scanners, Manufacturing, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top