Daniel Harel
at Applied Materials
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Deep ultraviolet, Polarization, Inspection, Process control, Finite element methods, Wafer inspection, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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