Dr. Daniel Henry
Advanced Patterning Programmer at STMicroelectronics
SPIE Involvement:
Conference Program Committee | Author
Publications (16)

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Silica, Databases, Chromium, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | August 27, 2005
Proc. SPIE. 5858, Nano- and Micro-Metrology
KEYWORDS: Ellipsometry, Lithography, Spectroscopy, Scanning electron microscopy, Scatterometry, Reflectometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Edge roughness

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Diffraction, Matrices, Spectroscopy, Dielectrics, Silicon, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Optical lithography, Manufacturing, Photomasks, Optical proximity correction, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Optics manufacturing, Standards development

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Etching, Silicon, Manufacturing, Printing, Photomasks, Semiconducting wafers, Projection lithography

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Etching, Coating, Manufacturing, Line width roughness, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers

Showing 5 of 16 publications
Conference Committee Involvement (3)
Emerging Lithographic Technologies IX
1 March 2005 | San Jose, California, United States
Emerging Lithographic Technologies VIII
24 February 2004 | Santa Clara, California, United States
Emerging Lithographic Technologies VII
25 February 2003 | Santa Clara, California, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top