Dr. Daniel Henry
Advanced Patterning Programmer at STMicroelectronics
SPIE Involvement:
Conference Program Committee | Author
Publications (16)

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Pellicles, Photomasks, Silica, Lithography, Chromium, Monochromatic aberrations, Semiconducting wafers, Databases, Optical lithography, Critical dimension metrology

Proceedings Article | 27 August 2005
Proc. SPIE. 5858, Nano- and Micro-Metrology
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reflectometry, Scatter measurement, Ellipsometry, Scanning electron microscopy, Spectroscopy, Lithography, Edge roughness

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Photomasks, Lithography, Monte Carlo methods, Critical dimension metrology, Optical proximity correction, Polarization, Lithographic illumination, Optical lithography, SRAF, Nanoimprint lithography

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Chromium, Photomasks, Scattering, Semiconducting wafers, Optical proximity correction, Lithography, Phase shifts, Scanners, Diffraction, Etching

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Scatterometry, Matrices, Critical dimension metrology, Spectroscopy, Scatter measurement, Silicon, Scanning electron microscopy, Dielectrics, Diffraction, Semiconducting wafers

Showing 5 of 16 publications
Conference Committee Involvement (3)
Emerging Lithographic Technologies IX
1 March 2005 | San Jose, California, United States
Emerging Lithographic Technologies VIII
24 February 2004 | Santa Clara, California, United States
Emerging Lithographic Technologies VII
25 February 2003 | Santa Clara, California, United States
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