Dr. Daniel J. C. Herr Profile

Dr. Daniel J. C. Herr

Professor - Nanoscience at Univ of North Carolina at Greensboro

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 23 March 2020 Presentation + Paper

An introduction to SemiSynBio Initiative and selected convergence results

Daniel J. Herr

Proceedings Volume 11324, 113240W (2020) https://doi.org/10.1117/12.2552536

KEYWORDS: Semiconductors, Biology, Data storage, Nanowires, Computing systems, Single sideband modulation, Interfaces, Biotechnology, Nanolithography, Data processing

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Proceedings Article | 5 June 2019 Paper

Novel approach to sub-5-nm patterning platforms: the self-assembly of metal conjugated bio-inspired molecules

Hemali Rathnayake, Gayani Pathiraja, Daniel Herr

Proceedings Volume 10958, 1095811 (2019) https://doi.org/10.1117/12.2518995

KEYWORDS: Metals, Copper, Optical lithography, Molecular self-assembly, Head, Oxides, Nanomaterials, Molecules, Transmission electron microscopy, Ions

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The manufacturable integration of geometric, equivalent and 3D scaling will drive Future Beyond CMOS devices and information processing technologies and systems. Additionally, interface control and low-energy functional patterning of non-traditional materials will enable the integration of novel heterogeneous 3D materials and systems. For future patterning technologies, resolution and defectivity, as well as line edge and interface roughness continue as key potential show-stoppers. Furthermore, the current resist-based patterning strategy requires a subsequent pattern transfer step, which adds to the stochastic nature and variability of the patterning and pattern transfer processes, and the challenge of achieving low defect sub-10 nm patterns will only increase with each technology generation. The Internet-of-Things era opens an enormous research space and opportunity for exploring emerging research materials (ERMs) that exhibit the potential for achieving sub-8-nm functional feature sizes via the directed self-assembly of novel non-block copolymer (BCP) and nanomaterials. Utilizing intramolecular hydrophilic-hydrophobic interactions as a driving force for self-assembly, we designed and developed a method to fabricate molecular patterning platforms that leverage interactions between bioinspired amphiphilic molecules and various metal cation-conjugates. This system also appears to exhibit a dynamic chi, χ, during the assembly process, which would enhance the formation of highly resolved self-assembled structures. With this method, we were able to demonstrate 2.9±0.8 nm (1σ; n=11) ordered metal/organic line patterns, with a pitch of 7.4±2.0 nm (1σ; n=10), and conductivity through the metal nanowires. While still in the ‘ugly duckling’ stage of development, this study demonstrates the feasibility of achieving self-assembled sub-4 nm functional nanostructures. This breakthrough technology opens the door to new families of self-assembling materials options, with the potential to serve as an inexpensive and effective way to pattern high-resolution features, such as for nanoelectronics, bioelectronics and other emerging 21st century information processing technologies.

Proceedings Article | 6 April 2007 Paper

Emerging patterning materials: trends, challenges, and opportunities in patterning and materials by design

Daniel Herr

Proceedings Volume 6519, 651903 (2007) https://doi.org/10.1117/12.721750

KEYWORDS: Optical lithography, Lithography, Nanomaterials, Manufacturing, Nanolithography, Nanostructures, Photomasks, Photoresist materials, Nanofabrication, Directed self assembly

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Proceedings Article | 21 May 1996 Paper

Managing environmentally benign semiconductor manufacturing research

Daniel Herr

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240089

KEYWORDS: Semiconductors, Semiconductor manufacturing, Manufacturing, Safety, Visibility, Sustainable technology, Analytical research, Research management, Raw materials

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Proceedings Article | 1 June 1991 Paper

Dissolution inhibition mechanism of ANR photoresists: crosslinking vs. -OH site consumption

James Thackeray, George Orsula, Martha Rajaratnam, Roger Sinta, Daniel Herr, Edward Pavelchek

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46357

KEYWORDS: Polymers, Photoresist materials, Deep ultraviolet, Excimer lasers, Chromatography, Lithography, Photoresist developing, Oxygen, Oxides, Silicon

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Proceedings Article | 1 May 1990 Paper

Advanced chemically amplified resist

Hideki Takahashi, Kenichi Wakui, Daniel Herr, John Petersen, Theodore Fedynyshyn, Michael Cronin

Proceedings Volume 1263, (1990) https://doi.org/10.1117/12.20166

KEYWORDS: Image quality, X-ray technology, Image processing, X-ray lithography, X-rays, Photoresist processing, Electrons, Chemically amplified resists, Lithography, Silver

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Showing 5 of 6 publications

SPIE Conference Volume | 1 April 2011

Alternative Lithographic Technologies III

SPIE Conference Volume | 10 March 2010

Alternative Lithographic Technologies II

SPIE Conference Volume | 2 June 2003

Metrology, Inspection, and Process Control for Microlithography XVII

SPIE Conference Volume | 16 July 2002

Metrology, Inspection, and Process Control for Microlithography XVI

Conference Committee Involvement (43)

Novel Patterning Technologies 2024

26 February 2024 | San Jose, California, United States

Novel Patterning Technologies 2023

27 February 2023 | San Jose, California, United States

Novel Patterning Technologies 2022

25 April 2022 | San Jose, California, United States

Novel Patterning Technologies 2021

22 February 2021 | Online Only, California, United States

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020

24 February 2020 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXII

26 February 2018 | San Jose, California, United States

Novel Patterning Technologies 2018

26 February 2018 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXI

27 February 2017 | San Jose, California, United States

Emerging Patterning Technologies 2017

27 February 2017 | San Jose, California, United States

Alternative Lithographic Technologies VIII

22 February 2016 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXX

22 February 2016 | San Jose, California, United States

Alternative Lithographic Technologies VII

23 February 2015 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIX

23 February 2015 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVIII

24 February 2014 | San Jose, California, United States

Alternative Lithographic Technologies VI

24 February 2014 | San Jose, California, United States

Alternative Lithographic Technologies V

25 February 2013 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVII

25 February 2013 | San Jose, California, United States

Alternative Lithographic Technologies IV

13 February 2012 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVI

13 February 2012 | San Jose, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V

24 August 2011 | San Diego, California, United States

Alternative Lithographic Technologies III

1 March 2011 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXV

28 February 2011 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices VII

3 August 2010 | San Diego, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing IV

2 August 2010 | San Diego, California, United States

Alternative Lithographic Technologies II

23 February 2010 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIV

22 February 2010 | San Jose, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing III

4 August 2009 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices VI

4 August 2009 | San Diego, California, United States

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIII

23 February 2009 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices V

13 August 2008 | San Diego, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing II

10 August 2008 | San Diego, California, United States

Emerging Lithographic Technologies XII

26 February 2008 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXII

25 February 2008 | San Jose, California, United States

Instrumentation, Metrology, and Standards for Nanomanufacturing

29 August 2007 | San Diego, California, United States

Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III

28 August 2007 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices IV

27 August 2007 | San Diego, California, United States

Metrology, Inspection, and Process Control for Microlithography XXI

26 February 2007 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XX

20 February 2006 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XIX

28 February 2005 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XVIII

23 February 2004 | Santa Clara, California, United States

Metrology, Inspection, and Process Control for Microlithography XVII

24 February 2003 | Santa Clara, California, United States

Metrology, Inspection, and Process Control for Microlithography XVI

4 March 2002 | Santa Clara, California, United States

Showing 5 of 43 Conference Committees

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