Daniel M. Hill
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 16 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Opacity, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top