Daniel R. Hines
at Univ of Maryland College Park
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | September 13, 2007
Proc. SPIE. 6658, Organic Field-Effect Transistors VI
KEYWORDS: Gold, Polymethylmethacrylate, Graphene, Electrodes, Polymers, Dielectrics, Silicon, Printing, Positron emission tomography, Nanowires

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Data modeling, Scattering, X-rays, X-ray sources, Silicon, Laser scattering, Reflectivity, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Semiconductors, Thin films, Lithography, Electron beam lithography, Optical lithography, X-rays, Dielectrics, Silicon, Reflectivity, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Nanostructures, Polymethylmethacrylate, Scattering, Polymers, Annealing, X-rays, Reflectivity, Picosecond phenomena, Nanoimprint lithography, Temperature metrology

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Oxides, Nanostructures, Data modeling, Scattering, X-rays, Silicon, Reflectivity, Nanoimprint lithography, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Metrology, Data modeling, Scattering, X-rays, Silicon, Reflectivity, Scanning electron microscopy, Nanoimprint lithography, Reactive ion etching, Semiconducting wafers

Showing 5 of 6 publications
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