Dr. Daniel Kandel
Principal Scientist at KLA Israel
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Diffraction, Metrology, Calibration, Scanners, Scatterometry, Finite element methods, Photomasks, Semiconducting wafers, Phase shifts

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Optical lithography, Scanners, Error analysis, Inspection, Control systems, Quality measurement, Precision measurement, Process control, Overlay metrology

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Wafer-level optics, Diffraction, Optical filters, Metrology, Computer simulations, Clouds, Quality measurement, Optical simulations, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Scanners, Error analysis, Control systems, Scatterometry, Finite element methods, Neural networks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Metrology, Calibration, Scanners, Spectroscopy, Polarizers, Double patterning technology, Semiconducting wafers, Overlay metrology, Diffraction gratings

Showing 5 of 9 publications
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