Daniel H. Liu
Senior Photo Process Engineer at TDK Headway Technologies
SPIE Involvement:
Publications (5)

Proceedings Article | 16 March 2009 Paper
Daniel Liu, Tom Zhong, Terry Torng
Proceedings Volume 7274, 72743F (2009) https://doi.org/10.1117/12.807753
KEYWORDS: Photomasks, Double patterning technology, Lithography, Chemical mechanical planarization, Manufacturing, Optical lithography, Semiconducting wafers, Tolerancing, Magnetism, Etching

Proceedings Article | 24 March 2006 Paper
Tom Zhong, Daniel Liu, Amit Moran, Michael Levkovitch, Michael Har-Zvi, Bob Burkhardt
Proceedings Volume 6152, 61522L (2006) https://doi.org/10.1117/12.659739
KEYWORDS: Critical dimension metrology, Resistance, Magnetism, Process control, Metrology, Semiconducting wafers, Algorithm development, Mobile devices, Cell phones, Consumer electronics

Proceedings Article | 18 August 2000 Paper
Hang-Yip Liu, Steffen Schulze, Alan Thomas, Anne McGuire, Michael Cross
Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395715
KEYWORDS: Lithography, Photomasks, Resolution enhancement technologies, Optical lithography, Printing, Mask making, Inspection, Scanning electron microscopy

Proceedings Article | 11 June 1999 Paper
Zhijian Lu, Yuping Cui, Alan Thomas, Scott Mansfield, Gerhard Kunkel, David Dobuzinsky, Franz Zach, Daniel Liu, K. Rex Chen, George Jordhamo, Alois Gutmann, Timothy Farrell
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350280
KEYWORDS: Printing, Etching, Photomasks, Oxides, Phase shifts, Lithography, Optical lithography, Optical properties, Electroluminescence, Resistance

Proceedings Article | 10 June 1994 Paper
Proceedings Volume 2155, (1994) https://doi.org/10.1117/12.177425
KEYWORDS: Spectral resolution, Light, Nonlinear dynamics, Ultrafast phenomena, Picosecond phenomena, Modulation, Data conversion, Optical resolution, Laser sources, Nonlinear optics

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