Daniel Lopez
Business Manager at KLA Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 25 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Modulation, Polarization, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Modulation, Polarization, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Critical dimension metrology, Feedback control, Semiconducting wafers

Proceedings Article | 24 July 1996 Paper
Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Calibration, Inspection, Silicon films, Photomasks, Critical dimension metrology, Phase shifts, Defect inspection

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