Daniel Miller
at Leonardo DRS
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Monochromatic aberrations, Edge detection, Imaging systems, Image processing, Manufacturing, Wavefronts, Scanning electron microscopy, Zernike polynomials, Photomasks

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: FT-IR spectroscopy, Transparency, Optical lithography, Polymers, Spectroscopy, Silicon, Photoresist materials, Photomasks, Absorbance, Semiconducting wafers

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Transparency, Optical lithography, Imaging systems, Polymers, Photoresist materials, Absorbance, Phase measurement, Vacuum ultraviolet, Semiconducting wafers

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, FT-IR spectroscopy, Metrology, Transparency, Data modeling, Opacity, Scanning electron microscopy, Photoresist materials, Systems modeling, Absorption

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Contamination, Polymers, Molecules, Silicon, Oxygen, Photoresist materials, Vacuum ultraviolet, Fluorine, Plasma, Absorption

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Transparency, Etching, Dry etching, Polymers, Photoresist materials, Photomasks, Absorbance, Fluorine, Absorption

Showing 5 of 13 publications
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