Mr. Daniel J. Prager
at Tokyo Electron America Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Etching, Error analysis, Control systems, Scatterometry, Process control, Critical dimension metrology, Feedback control, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Calibration, Etching, Error analysis, Silicon, Silver, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers

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