Mr. Daniel Salazar Barrera
Senior R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Area of Expertise:
MDP/DFM , Computational geometry , Automatic control , C/C++/TCL programming languages , Linux/Unix software development , Digital image processing
Websites:
Publications (5)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Detection and tracking algorithms, Manufacturing, Distance measurement, Design for manufacturing, Computed tomography, Optical proximity correction, Data conversion, Algorithm development, Tolerancing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Eye, Metrology, Cadmium, Manufacturing, Scanning electron microscopy, Data processing, Photomasks, Computed tomography, Image classification, Tolerancing

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Wavefronts, Nomenclature, Data processing, Photomasks, Computed tomography, Explosives, Beam shaping, Vestigial sideband modulation, Current controlled current source, Next generation lithography mask technology

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Roads, Manufacturing, Inspection, Data processing, Process control, Software development, Photomasks, Computed tomography, Optical proximity correction, Data conversion

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Human-machine interfaces, Eye, Metrology, Visualization, Scanning electron microscopy, Optical metrology, Solids, Computed tomography, Photomask technology, Library classification systems

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