Dr. Daniel P. Sanders Profile

Dr. Daniel P. Sanders

Manager at IBM Research - Almaden

SPIE Involvement:

Author | Editor

Publications (32)

Proceedings Article | 15 November 2022 Presentation

Accelerated discovery of materials for a sustainable future of computing

Daniel Sanders

Proceedings Volume PC12293, PC1229304 (2022) https://doi.org/10.1117/12.2652970

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Proceedings Article | 22 February 2021 Presentation

Welcome and Introduction to SPIE Conference 11612

Daniel Sanders, Douglas Guerrero

Proceedings Volume 11612, 1161202 (2021) https://doi.org/10.1117/12.2592868

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Proceedings Article | 25 March 2019 Presentation

Model reactivity of inorganic and organometallic materials in EUV (Conference Presentation)

Wyatt Thornley, Hoa Truong, Martha Sanchez, Daniel Sanders, Gregory Wallraff, Oleg Kostko, D. Frank Ogletree, Daniel Slaughter

Proceedings Volume 10960, 1096005 (2019) https://doi.org/10.1117/12.2515134

KEYWORDS: Extreme ultraviolet, Metals, Manufacturing, Semiconductor manufacturing, Semiconductors, Resolution enhancement technologies, Photoresist materials, Extreme ultraviolet lithography, Thermal modeling, Photochemistry

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Proceedings Article | 13 April 2017 Presentation + Paper

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

Cheng Chi, Chi-Chun Liu, Luciana Meli, Jing Guo, Doni Parnell, Yann Mignot, Kristin Schmidt, Martha Sanchez, Richard Farrell, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Yongan Xu, Daniel Sanders, David Hetzer, Andrew Metz, Sean Burns, Nelson Felix, John Arnold, Daniel Corliss

Proceedings Volume 10146, 101460Q (2017) https://doi.org/10.1117/12.2260454

KEYWORDS: Etching, Directed self assembly, Polymethylmethacrylate, Critical dimension metrology, Picosecond phenomena, Oxides, Scanning electron microscopy, Optical lithography, Extreme ultraviolet, Metals

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Proceedings Article | 27 March 2017 Paper

DSA patterning options for logics and memory applications

Chi-Chun Liu, Elliott Franke, Yann Mignot, Scott LeFevre, Stuart Sieg, Cheng Chi, Luciana Meli, Doni Parnell, Kristin Schmidt, Martha Sanchez, Lovejeet Singh, Tsuyoshi Furukawa, Indira Seshadri, Ekmini Anuja De Silva, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard Farrell, Robert Bruce, Mark Somervell, Daniel Sanders, Nelson Felix, John Arnold, David Hetzer, Akiteru Ko, Andrew Metz, Matthew Colburn, Daniel Corliss

Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479

KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

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SPIE Journal Paper | 7 February 2017

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Kafai Lai, Chi-Chun Liu, Hsinyu Tsai, Yongan Xu, Cheng Chi, Ananthan Raghunathan, Parul Dhagat, Lin Hu, Oseo Park, Sunggon Jung, Wooyong Cho, Jaime Morillo, Jed Pitera, Kristin Schmidt, Mike Guillorn, Markus Brink, Daniel Sanders, Nelson Felix, Todd Bailey, Matthew Colburn

JM3, Vol. 16, Issue 01, 013502, (February 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013502

KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

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Proceedings Article | 4 April 2016 Paper

DSA via hole shrink for advanced node applications

Cheng Chi, Chi-Chun Liu, Luciana Meli, Kristin Schmidt, Yongan Xu, Ekmini Anuja DeSilva, Martha Sanchez, Richard Farrell, Hongyun Cottle, Daiji Kawamura, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Jed Pitera, Daniel Sanders, David Hetzer, Andrew Metz, Nelson Felix, John Arnold, Matthew Colburn

Proceedings Volume 9777, 97770L (2016) https://doi.org/10.1117/12.2219706

KEYWORDS: Directed self assembly, Polymethylmethacrylate, Picosecond phenomena, Etching, Global Positioning System, Critical dimension metrology, Optical lithography, Lithography, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 1 April 2016 Paper

Strategies to enable directed self-assembly contact hole shrink for tight pitches

Kristin Schmidt, Hitoshi Osaki, Kota Nishino, Martha Sanchez, Chi-Chun Liu, Tsuyoshi Furukawa, Cheng Chi, Jed Pitera, Nelson Felix, Daniel Sanders

Proceedings Volume 9777, 97771U (2016) https://doi.org/10.1117/12.2219213

KEYWORDS: Surface properties, Integrated circuits, Semiconductors, Monte Carlo methods, Directed self assembly, Picosecond phenomena, Polymethylmethacrylate, Chemistry, Atomic force microscopy, Scattering, Lithography

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Proceedings Article | 25 March 2016 Paper

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication

HsinYu Tsai, Hiroyuki Miyazoe, Ankit Vora, Teddie Magbitang, Noel Arellano, Chi-Chun Liu, Michael Maher, William Durand, Simon Dawes, James Bucchignano, Lynne Gignac, Daniel Sanders, Eric Joseph, Matthew Colburn, C. Grant Willson, Christopher Ellison, Michael Guillorn

Proceedings Volume 9779, 977910 (2016) https://doi.org/10.1117/12.2219544

KEYWORDS: Line edge roughness, Line width roughness, Lithography, Polymers, Etching, Semiconductors, Manufacturing, Directed self assembly, Silicon, Plasma, Oxygen

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Proceedings Article | 22 March 2016 Paper

DSA patterning options for FinFET formation at 7nm node

Chi-Chun Liu, Elliott Franke, Fee Li Lie, Stuart Sieg, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard Farrell, Mark Somervell, Daniel Sanders, Nelson Felix, Michael Guillorn, Sean Burns, David Hetzer, Akiteru Ko, John Arnold, Matthew Colburn

Proceedings Volume 9777, 97770R (2016) https://doi.org/10.1117/12.2219670

KEYWORDS: Directed self assembly, Optical lithography, Lithography, Line edge roughness, Etching, Silicon, Image processing, Neodymium, Polymethylmethacrylate

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Proceedings Article | 21 March 2016 Paper

Contrast enhanced diffusion NMR: quantifying impurities in block copolymers for DSA

Rudy Wojtecki, Ellie Porath, Ankit Vora, Alshakim Nelson, Daniel Sanders

Proceedings Volume 9779, 977922 (2016) https://doi.org/10.1117/12.2218633

KEYWORDS: Diffusion, Polymers, Polymethylmethacrylate, Molecular self-assembly, Spectroscopy, Chromatography, Magnetism, Lithography, Adsorption, Liquids, Thin films, Picosecond phenomena, Polymerization, Rhodium, Carbonates

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch

HsinYu Tsai, Hiroyuki Miyazoe, Joy Cheng, Markus Brink, Simon Dawes, David Klaus, James Bucchignano, Daniel Sanders, Eric Joseph, Matthew Colburn, Michael Guillorn

Proceedings Volume 9423, 942314 (2015) https://doi.org/10.1117/12.2084845

KEYWORDS: Etching, Silicon, Photomasks, Line edge roughness, Polymethylmethacrylate, Tolerancing, Polymers, Optical lithography, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Customization and design of directed self-assembly using hybrid prepatterns

Joy Cheng, Gregory Doerk, Charles Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Hsinyu Tsai, Chi-Chun Liu, Michael Guillorn, Daniel Sanders

Proceedings Volume 9423, 942307 (2015) https://doi.org/10.1117/12.2086973

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, System on a chip, Scanning electron microscopy, Image segmentation, Photomasks, Etching, Electron beam lithography, Composites, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

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SPIE Journal Paper | 25 September 2013

Pattern transfer of directed self-assembly patterns for CMOS device applications

Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Lynne Gignac, James Bucchignano, David Klaus, Christopher Breslin, Eric Joseph, Joy Cheng, Daniel Sanders, Michael Guillorn, Chi-Chun Liu

JM3, Vol. 12, Issue 04, 041305, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041305

KEYWORDS: Etching, Optical lithography, Photomasks, Silicon, Carbon, Polymethylmethacrylate, Plasma, Metals, Line edge roughness, Directed self assembly

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Proceedings Article | 9 September 2013 Paper

Defects on high-resolution negative-tone resist: "The revenge of the blobs"

M. Sanchez, L. Sundberg, L. Bozano, R. Sooriyakumaran, D. Sanders, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, A. Zweber

Proceedings Volume 8880, 88800V (2013) https://doi.org/10.1117/12.2028753

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Switching, Chromium, Switches, Silicon, Ultraviolet radiation, Lamps, Optical microscopes

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Proceedings Article | 29 March 2013 Paper

Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications

Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Sarunya Bangsaruntip, Isaac Lauer, Jim Bucchignano, Dave Klaus, Lynne Gignac, Eric Joseph, Joy Cheng, Dan Sanders, Michael Guillorn

Proceedings Volume 8685, 86850L (2013) https://doi.org/10.1117/12.2014259

KEYWORDS: Etching, Line edge roughness, Optical lithography, Silicon, Annealing, Polymethylmethacrylate, Photomasks, Electron beam lithography, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Deterministically isolated gratings through the directed self-assembly of block copolymers

Gregory Doerk, Joy Cheng, Charles Rettner, Srinivasan Balakrishnan, Noel Arellano, Daniel Sanders

Proceedings Volume 8680, 86800Y (2013) https://doi.org/10.1117/12.2011629

KEYWORDS: Lithography, Epitaxy, Scanning electron microscopy, Custom fabrication, Polymers, Optical alignment, Polymethylmethacrylate, Etching, Oxygen, Directed self assembly

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SPIE Journal Paper | 9 August 2012 Open Access

Special Section Guest Editorial: Directed Self-Assembly

Daniel Sanders

JM3, Vol. 11, Issue 3, 031301, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031301

KEYWORDS: Lithography, Electron beam lithography, Nanotechnology, Plasma etching, Etching, Nanofabrication, Semiconducting wafers, Plasma, Nanoimprint lithography, Directed self assembly

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Proceedings Article | 16 April 2012 Paper

Directed self-assembly defectivity assessment. Part II

Chris Bencher, He Yi, Jessica Zhou, Manping Cai, Jeffrey Smith, Liyan Miao, Ofir Montal, Shiran Blitshtein, Alon Lavi, Kfir Dotan, Huixiong Dai, Joy Cheng, Daniel Sanders, Melia Tjio, Steven Holmes

Proceedings Volume 8323, 83230N (2012) https://doi.org/10.1117/12.917993

KEYWORDS: Polymethylmethacrylate, Metrology, Image registration, Scanning electron microscopy, Inspection, Semiconducting wafers, Signal to noise ratio, Polymers, Optical lithography, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns

Gregory Doerk, Chi-Chun Liu, Joy Cheng, Charles Rettner, Jed Pitera, Leslie Krupp, Teya Topuria, Noel Arellano, Daniel Sanders

Proceedings Volume 8323, 83230P (2012) https://doi.org/10.1117/12.916421

KEYWORDS: Polymethylmethacrylate, Oxygen, Chemical analysis, Reactive ion etching, Polymers, Epitaxy, Etching, Error analysis, Lithography, Directed self assembly

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Proceedings Article | 2 April 2011 Paper

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

Chris Bencher, Jeffrey Smith, Liyan Miao, Cathy Cai, Yongmei Chen, Joy Cheng, Daniel Sanders, Melia Tjio, Hoa Truong, Steven Holmes, William Hinsberg

Proceedings Volume 7970, 79700F (2011) https://doi.org/10.1117/12.881293

KEYWORDS: Semiconducting wafers, Optical lithography, Etching, Polymers, Lithography, Semiconductors, Inspection, Chemical vapor deposition, Silicon, Directed self assembly

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Proceedings Article | 1 April 2010 Paper

Self-assembling materials for lithographic patterning: overview, status, and moving forward

William Hinsberg, Joy Cheng, Ho-Cheol Kim, Daniel Sanders

Proceedings Volume 7637, 76370G (2010) https://doi.org/10.1117/12.852230

KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Image processing, Dry etching, Gold, Photomasks, Reactive ion etching, Directed self assembly

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Proceedings Article | 31 March 2010 Paper

High contact angle fluorosulfonamide-based materials for immersion lithography

Daniel Sanders, Linda Sundberg, Masaki Fujiwara, Yoshiharu Terui, Manabu Yasumoto

Proceedings Volume 7639, 763925 (2010) https://doi.org/10.1117/12.847257

KEYWORDS: Photoresist materials, Polymers, Lithography, Immersion lithography, Semiconducting wafers, Glasses, Photoresist developing, Roads, Water, Interfaces

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Proceedings Article | 4 April 2008 Paper

Self-segregating materials for immersion lithography

Daniel Sanders, Linda Sundberg, Phillip Brock, Hiroshi Ito, Hoa Truong, Robert Allen, Gregory McIntyre, Dario Goldfarb

Proceedings Volume 6923, 692309 (2008) https://doi.org/10.1117/12.772937

KEYWORDS: Polymers, Water, Immersion lithography, Photoresist materials, Lithography, Natural surfaces, Interfaces, Semiconducting wafers, Optical properties, Fluorine

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Proceedings Article | 26 March 2008 Paper

The limitations of high-index resists for 193-nm hyper-NA lithography

Gregory McIntyre, Daniel Sanders, Ratnam Sooriyakumaran, Hoa Truong, Robert Allen

Proceedings Volume 6923, 692304 (2008) https://doi.org/10.1117/12.773114

KEYWORDS: Absorption, Refractive index, Water, Lithography, Polarization, Refraction, Chemistry, Critical dimension metrology, Sodium, Reflection

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Proceedings Article | 26 March 2008 Paper

Graded spin-on organic bottom antireflective coating for high NA lithography

Dario Goldfarb, Sean Burns, Libor Vyklicky, Dirk Pfeiffer, Anthony Lisi, Karen Petrillo, John Arnold, Daniel Sanders, Aleksandra Clancy, Robert Lang, Robert Allen, David Medeiros, Dah Chung Owe-Yang, Kazumi Noda, Seiichiro Tachibana, Shozo Shirai

Proceedings Volume 6923, 69230V (2008) https://doi.org/10.1117/12.772268

KEYWORDS: Reflectivity, Polymers, Photoresist materials, Silicon, Etching, Lithography, Optical lithography, Interfaces, Multilayers, Semiconducting wafers

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Proceedings Article | 21 March 2008 Paper

Integration of polymer self-assembly for lithographic application

Joy Cheng, Daniel Sanders, Ho-Cheol Kim, Linda Sundberg

Proceedings Volume 6921, 692127 (2008) https://doi.org/10.1117/12.773247

KEYWORDS: Polymers, Lithography, Optical lithography, Thin films, Polymethylmethacrylate, Process control, Nanostructures, Platinum, Gold, Directed self assembly

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Proceedings Article | 2 April 2007 Paper

Fluoro-alcohol materials with tailored interfacial properties for immersion lithography

Daniel Sanders, Linda Sundberg, Ratnam Sooriyakumaran, Phillip Brock, Richard DiPietro, Hoa Truong, Dolores Miller, Margaret Lawson, Robert Allen

Proceedings Volume 6519, 651904 (2007) https://doi.org/10.1117/12.712768

KEYWORDS: Fluorine, Polymers, Immersion lithography, Lithography, Interfaces, Semiconducting wafers, Carbon, Water, Surface properties, Hydrogen

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Proceedings Article | 2 April 2007 Paper

Contact angles and structure/surface property relationships of immersion materials

Linda Sundberg, Daniel Sanders, Ratnam Sooriyakumaran, Phillip Brock, Robert Allen

Proceedings Volume 6519, 65191Q (2007) https://doi.org/10.1117/12.712632

KEYWORDS: Fluorine, Polymers, Immersion lithography, Surface properties, Semiconducting wafers, Polymer thin films, Lithography, Carbon, Silicon, Quartz

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Proceedings Article | 24 August 2001 Paper

Resist materials for 157-nm microlithography: an update

Raymond Hung, Hoang Tran, Brian Trinque, Takashi Chiba, Shintaro Yamada, Daniel Sanders, Eric Connor, Robert Grubbs, John Klopp, Jean Frechet, Brian Thomas, Gregory Shafer, Darryl DesMarteau, Will Conley, C. Grant Willson

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436870

KEYWORDS: Polymers, Absorbance, Fluorine, Carbon monoxide, Polymerization, Palladium, Transparency, Nickel, Lithography, Vacuum ultraviolet

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