Dr. Daniel Schmidt
at IBM Research
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

Proceedings Article | 16 April 2024 Presentation + Paper
Katherine Sieg, Christopher Bottoms, Christopher Waskiewicz, Alejandro Matos Mejia, Junwon Han, Shahid Butt, Daniel Schmidt, Stefan Schoeche, Alexander Hamer, Alex Hubbard
Proceedings Volume 12955, 129551P (2024) https://doi.org/10.1117/12.3012149
KEYWORDS: Semiconducting wafers, Interferometry, Wafer bonding, Metrology

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129551O (2024) https://doi.org/10.1117/12.3011748
KEYWORDS: Semiconducting wafers, Wafer level optics, Metrology, Silicon, Reactive ion etching, Reflection, Interferometry, Dielectrics, Polarization, Semiconductor manufacturing

Proceedings Article | 10 April 2024 Presentation + Paper
Stefan Schoeche, Katherine Sieg, Daniel Schmidt, Mohsen Nasseri, Shogo Mochizuki, Marinus Hopstaken, Yaguang Zhu, Li Xiang, Julia Hoffman, Daniel Lewellyn, Paul Isbester, Sarah Okada
Proceedings Volume 12955, 1295508 (2024) https://doi.org/10.1117/12.3011666
KEYWORDS: Semiconducting wafers, Silicon, Epitaxy, Germanium, Nanosheets, Metrology, Annealing, Diffusion, Transistors

Proceedings Article | 10 April 2024 Presentation + Paper
Houssam Chouaib, Valeria Dimastrodonato, Anderson Chou, Agostino Cangianoa, Andrew Cross, Derrick Shaughnessy, Zhengquan Tan, Daniel Schmidt, Curtis Durfee, Shanti Pancharatnam, Julien Frougier, Andrew Greene, Mary Breton
Proceedings Volume 12955, 129550L (2024) https://doi.org/10.1117/12.3010790
KEYWORDS: Semiconducting wafers, Education and training, Transmission electron microscopy, Nanosheets, Gallium arsenide, Data modeling, Ellipsometry, Metrology, Diffractive optical elements, Mathematical optimization

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940S (2023) https://doi.org/10.1117/12.2661339
KEYWORDS: Monte Carlo methods, Extreme ultraviolet lithography, Scanners, Deep ultraviolet, Design and modelling, Semiconducting wafers, Overlay metrology, Photomasks, Extreme ultraviolet, Error analysis

Showing 5 of 23 publications
Conference Committee Involvement (3)
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
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