Dr. Daniel Schmidt
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 9 March 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Printing

Proceedings Article | 5 March 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Metrology, Silicon, Reflectivity, Interferometry, Transmission electron microscopy, Scatterometry, Reflectometry, Semiconductor manufacturing, Polarization control

Proceedings Article | 25 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Diffraction, Metrology, Optical lithography, Germanium, X-ray diffraction, Silicon, Manufacturing, Nondestructive evaluation, Raman spectroscopy, Transistors

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Semiconductors, Nanotechnology, Metrology, Logic, Gallium arsenide, Manufacturing, Nondestructive evaluation, Machine learning, Transistors, Line edge roughness

Proceedings Article | 4 May 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Photoresist materials, Scatterometry, Machine learning, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Showing 5 of 11 publications
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