Dr. Daniel Sobieski
Staff Engineer at Lam Research Corp.
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Etching, Bridges, Photoresist processing, Extreme ultraviolet lithography, Metrology, Computer simulations, Focus stacking software, Stochastic processes, Time metrology, Optical lithography

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Etching, Critical dimension metrology, Line width roughness, Lithography, Line edge roughness, Stochastic processes, Semiconducting wafers, Optical lithography, Photomasks, Extreme ultraviolet

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Etching, Scanners, Semiconducting wafers, Optical lithography, Overlay metrology, Lithography, Immersion lithography, Metrology, Atomic force microscopy, Ions, Critical dimension metrology

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Critical dimension metrology, Etching, Lithography, Optical lithography, Scanners, Process control, Logic, Scatterometry, Photomasks, Plasma etching, Metrology

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