Dr. Daniel Sobieski
Staff Engineer at Lam Research Corp.
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Metrology, Optical lithography, Etching, Computer simulations, Time metrology, Bridges, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Focus stacking software

Proceedings Article | 20 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Ions, Atomic force microscopy, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Logic, Optical lithography, Etching, Scanners, Scatterometry, Process control, Photomasks, Plasma etching, Critical dimension metrology

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