Daniel Sullivan
Senior Staff Engineer at Seagate Technology LLC
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Wafer-level optics, Thin films, Lithography, Optical lithography, Etching, Manufacturing, Head, Nanoimprint lithography, Neodymium, Semiconducting wafers

SPIE Journal Paper | 2 August 2013
JM3 Vol. 12 Issue 03
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Optical lithography, Head, Thin films, Lithography, Manufacturing, Thin film manufacturing, Etching, Overlay metrology

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Feature extraction, Photoresist materials, Photomasks, Critical dimension metrology, Photoresist processing, Tolerancing, Photoresist developing, Industrial chemicals, Chemically amplified resists

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Modulation, Manufacturing, Photoresist materials, Photomasks, Critical dimension metrology, Reactive ion etching, Photoresist processing, Standards development, Industrial chemicals, Chemically amplified resists

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Opacity, Quartz, Nitrogen, Chromium, Photoresist materials, Compact discs, Critical dimension metrology, Thin film coatings, Standards development, Chemically amplified resists

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