Dr. Daniel C. Wack
VP at SVXR
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 25, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Modulation, Polarization, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Modulation, Polarization, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Metrology, Scattering, Light scattering, Scanning electron microscopy, Scatterometry, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Optical lithography, Etching, Spectroscopy, Reflectometry, Process control, Double patterning technology, Critical dimension metrology, Performance modeling, Systems modeling

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Refractive index, Matrices, Dielectrics, Silicon, Scatterometry, Finite element methods, Critical dimension metrology, Chemical elements, Algorithm development, Maxwell's equations

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