Daniel J. Williams
Development Eng Manager at
SPIE Involvement:
Author | Instructor
Publications (5)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Diffractive optical elements, Data modeling, Control systems, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Control systems design, Wafer testing, Temperature metrology

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Data modeling, Manufacturing, Computer programming, Cadmium sulfide, Critical dimension metrology, Thin film coatings, Semiconducting wafers, Systems modeling, Standards development

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Optical lithography, Numerical simulations, 3D modeling, Thermal effects, Thermal analysis, Ear, Semiconducting wafers, Performance modeling, Thermal modeling, Temperature metrology

PROCEEDINGS ARTICLE | August 14, 1997
Proc. SPIE. 3183, Microlithographic Techniques in IC Fabrication
KEYWORDS: Semiconductors, Lithography, Deep ultraviolet, Manufacturing, Photoresist materials, Semiconductor manufacturing, Semiconducting wafers, Performance modeling, Temperature metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | July 7, 1997
Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV
KEYWORDS: Semiconductors, Lithography, Deep ultraviolet, Manufacturing, Photoresist materials, Semiconductor manufacturing, Semiconducting wafers, Performance modeling, Temperature metrology, Chemically amplified resists

Course Instructor
SC780: Tracks 101: Microlithography Coat and Develop Basics
This course provides attendees with a introductory to intermediate working knowledge of microlithography coat and develop or "track" processes. "Track" is the industry jargon for the equipment used to deposit photoresist and subsequently develop the image after the substrate has been exposed. The course provides insight on process, equipment setup, and troubleshooting, focusing mainly on the hardware and the hardware's impact on the process results. You will become fluent with "track" parameters for many varied applications, and many practical and useful examples are included throughout.
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