Daniela Matiut
at Fraunhofer IIS
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Optical lithography, Calibration, Diffusion, Critical dimension metrology, Performance modeling, Systems modeling, Device simulation, Instrument modeling, Chemically amplified resists

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