Dr. Daniele Piumi
Sr Director Patterning at ASM Belgium NV
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Photoresist materials, Extreme ultraviolet lithography

Proceedings Article | 17 April 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Carbon, Lithography, Etching, Chemistry, Scanning electron microscopy, Photoresist materials, Line width roughness, Plasma enhanced chemical vapor deposition, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 20 March 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Semiconductors, Optical lithography, Metals, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Back end of line

Proceedings Article | 7 April 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Amorphous silicon, Semiconductors, Lithography, Optical lithography, Silica, Etching, Metals, Coating, Materials processing, Photomasks, Extreme ultraviolet, Double patterning technology, High volume manufacturing, System on a chip, Standards development, Tin

Proceedings Article | 7 April 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Optical lithography, Contamination, Etching, Metals, Silicon, Reflectivity, Photomasks, System on a chip, Plasma

Showing 5 of 8 publications
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