Dr. Danilo De Simone
Scientific Director at imec
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author
Publications (115)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295308 (2024) https://doi.org/10.1117/12.3009968
KEYWORDS: Extreme ultraviolet lithography, Optical properties, Extreme ultraviolet, Light sources and illumination, Refractive index, Semiconducting wafers, Simulations, Critical dimension metrology, 3D mask effects

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129553S (2024) https://doi.org/10.1117/12.3015844
KEYWORDS: Semiconducting wafers, Inspection, Extreme ultraviolet, Metrology, Light sources and illumination, Stochastic processes, Etching, Defect inspection, Transmission electron microscopy

Proceedings Article | 9 April 2024 Paper
Proceedings Volume 12957, 129570P (2024) https://doi.org/10.1117/12.3009737
KEYWORDS: Extreme ultraviolet lithography, Lithography, Polymers, Extreme ultraviolet, Film thickness, Etching, Electron beam lithography, Optical lithography, Photoresist materials, Critical dimension metrology

Proceedings Article | 9 April 2024 Paper
Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

Proceedings Article | 9 April 2024 Paper
Ying-Lin Chen, Van Tuong Pham, Jeonghoon Lee, Kaushik Sah, Seonggil Heo, Bappaditya Dey, Philippe Bezard, Maria Chistiakova, Sara Paolillo, Peter De Schepper, Danilo De Simone, Hyo Seon Suh, Victor Blanco, Soobin Hwang, Kenichi Miyaguchi
Proceedings Volume 12957, 129570V (2024) https://doi.org/10.1117/12.3010934
KEYWORDS: Printing, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Design, Cadmium, Source mask optimization, Scanning electron microscopy, Semiconducting wafers

Showing 5 of 115 publications
Conference Committee Involvement (7)
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Showing 5 of 7 Conference Committees
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