Dr. Dario L. Goldfarb
at IBM TJ Watson Research Ctr
SPIE Involvement:
Author
Publications (41)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Quartz, Polymers, Crystals, Interfaces, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Photoresist developing, Standards development

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Etching, Interfaces, Silicon, Materials processing, Image resolution, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Head-mounted displays, Photoresist processing, Semiconducting wafers, Systems modeling

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Contamination, Deep ultraviolet, Photons, Hydrogen, Quantum efficiency, Photoresist materials, Image quality, Iodine, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Defect detection, Modulation, Inspection, Image analysis, Pellicles, Photomasks, Extreme ultraviolet, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Metals, Silicon, Pellicles, Infrared radiation, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Silicon, Pellicles, Silicon films, Photomasks, Extreme ultraviolet, Wet etching, Extreme ultraviolet lithography, Semiconducting wafers, Liquids

Showing 5 of 41 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top