Dr. Dario L. Goldfarb
at IBM
SPIE Involvement:
Author
Publications (44)

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Optical lithography, Modulation, Etching, Image resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Modulation, Etching, Diffusion, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Stochastic processes

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Semiconductors, Oxides, Electron beam lithography, Optical lithography, Etching, Polymers, Interfaces, Semiconductor materials, Silicon, Head-mounted displays

Proceedings Article | 28 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Quartz, Polymers, Crystals, Interfaces, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Photoresist developing, Standards development

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Etching, Interfaces, Silicon, Materials processing, Image resolution, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Head-mounted displays, Photoresist processing, Semiconducting wafers, Systems modeling

Showing 5 of 44 publications
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