Dariusz Litwin received MSc degree in optical engineering, Warsaw University of Technology, in 1984 and PhD in physics, in 1994. In the years 1994-95 he was working at the University of Warwick, UK. His main interest is in the field of industry-oriented optical measurement technology. He was Secretary of SPIE Polish Chapter Board (1993-1999) and since 2002 a Review Committee and a member-founder of Association of Image Processing (member of the International Association for Pattern Recognition). He was the recipient of the T. Maiman Award in 1993, established by Laser Centers of America and SPIE, distinction in the Gold Engineer Competition 2000 and Rector Team Award for Research Achievements in 2004. Since October 2008 he has been Secretary of Council of Representatives of OPTOKLASTER – the Mazovian Photonic Technology Cluster. In 2014 he was nominated as professor of Institute of Applied Optics and in 2016 elected to the grade of Senior Member of SPIE.
Overview of the measuring systems where a continuously altered light source plays a key role: Part I
Symmetry descriptors for Si wafer characterisation for scanning helium atomic beam microscopy mirror
Variable wavelength and incidence angle techniques for refractive index and thickness measurements of fibers
Measurements of the geometrical characteristics of the silicon wafer for helium microscope focusing mirror
A comparative analysis of Si wafer surface structure based on AFM and scattered light measurement techniques
Measurement of birefringence of textile fibers based on the analysis of the interference pattern in the backfocal plane of the microscope objective