Darren L. Forman
Graduate Student at Univ of Colorado Boulder
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Point spread functions, Super resolution, Modulation, Cameras, Ultraviolet radiation, Relays, Optical alignment, Bragg cells, Camera shutters

PROCEEDINGS ARTICLE | February 8, 2012
Proc. SPIE. 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
KEYWORDS: Lithography, FT-IR spectroscopy, Super resolution, Polymers, Ultraviolet radiation, Photoresist materials, Polymerization, Photochemistry, Stimulated emission depletion microscopy, Absorption

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Diffraction, Metrology, Polarization, Etching, Light scattering, Scatterometry, Measurement devices, Analytical research, Critical dimension metrology

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Diffraction, Polarization, Silicon, Clouds, Atomic force microscopy, Scatterometry, Domes, Critical dimension metrology, Scatter measurement

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Diffraction, Nano opto mechanical systems, Data modeling, Photoresist materials, Scatterometry, Photomasks, Critical dimension metrology, Scatter measurement, Diffraction gratings

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical properties, Etching, Metals, Dielectrics, Atomic force microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Back end of line

Showing 5 of 7 publications
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