Dave J. Gerold
Staff CAE at Synopsys Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 4 April 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Mathematical modeling, Image segmentation, Manufacturing, Control systems, Computer simulations, Image analysis, Photomasks, Optical proximity correction, Convolution, Semiconducting wafers

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Databases, Matrices, Image processing, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Phase shifts

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Reticles, Metrology, Silicon, Photomasks, Computed tomography, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Image processing, Manufacturing, Computer simulations, Monte Carlo methods, Design for manufacturing, Photomasks, Optical proximity correction, TCAD, Resolution enhancement technologies

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Lithographic illumination, Quartz, Scanners, Photomasks, Optical proximity correction, Semiconducting wafers, Overlay metrology, Phase shifts, Fiber optic illuminators

Showing 5 of 22 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top