David Power
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Genetic algorithms, Data processing, Photomasks, Optical proximity correction, Optimization (mathematics)

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Calibration, Etching, Computer simulations, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Photovoltaics, Genetic algorithms, Metals, Inspection, Photomasks, Computational lithography, Optical proximity correction, Optimization (mathematics), Standards development, Resolution enhancement technologies

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