Dave C. White
Senior Litho Engineer at Photolithography Consulting and Coaching
SPIE Involvement:
Author
Area of Expertise:
Photolithography , EUV , Resist , Stepper , Scanner
Websites:
Profile Summary

20 years as a Lithography Engineer. Fujitsu then TOK Photoresist. Now Consulting for Photolithography.net. I have worked on all areas of lithography. Including EUV. I have co-authored a SPIE poster paper on ArF double patterning with Dr. Tom Wallow in 2007. I am interested in helping any semiconductor company with their litho needs whether g-line or advanced litho.

I have worked inside the following companies cleanrooms.
Seagate hard drive head and media sites
Cypress HGST
Polar Semi Western Digital
Linear Tech Texas Instruments
Intel Freescale
SVTC Microchip
Spansion Maxim
Publications (1)

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Etching, Image resolution, Scanning electron microscopy, Photoresist materials, Photomasks, Double patterning technology, Line edge roughness, Resolution enhancement technologies

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