Prof. David T. Attwood
Professor in Residence at Univ of California Berkeley
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (31)

PROCEEDINGS ARTICLE | October 6, 2011
Proc. SPIE. 8140, X-ray Lasers and Coherent X-ray Sources: Development and Applications IX
KEYWORDS: Microscopes, Diffraction, Imaging systems, X-rays, Image resolution, Gas lasers, Modulation transfer functions, Spatial resolution, X-ray lasers, Diffraction gratings

PROCEEDINGS ARTICLE | September 29, 2009
Proc. SPIE. 7451, Soft X-Ray Lasers and Applications VIII
KEYWORDS: Microscopes, Modulation, Microscopy, Objectives, Photomasks, Extreme ultraviolet lithography, Modulation transfer functions, Spatial resolution, X-ray lasers, Zone plates

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Microscopes, Inspection, Image resolution, Objectives, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Modulation transfer functions, Spatial resolution, Zone plates

PROCEEDINGS ARTICLE | October 12, 2007
Proc. SPIE. 6702, Soft X-Ray Lasers and Applications VII
KEYWORDS: Microscopes, Capillaries, Image processing, Microscopy, Silicon, Objectives, Charge-coupled devices, Spatial resolution, X-ray lasers, Zone plates

PROCEEDINGS ARTICLE | October 12, 2007
Proc. SPIE. 6702, Soft X-Ray Lasers and Applications VII
KEYWORDS: Diffraction, Polymethylmethacrylate, Signal attenuation, Spectroscopy, Silver, Atomic force microscopy, Laser ablation, Laser induced breakdown spectroscopy, X-ray lasers, Zone plates

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Microscopes, Imaging systems, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Spatial resolution, Zone plates, Plasma

Showing 5 of 31 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Emerging Lithographic Technologies XII
26 February 2008 | San Jose, California, United States
Emerging Lithographic Technologies XI
27 February 2007 | San Jose, California, United States
Emerging Lithographic Technologies X
21 February 2006 | San Jose, California, United States
Showing 5 of 9 published special sections
Course Instructor
SC123: Introduction to Extreme Ultraviolet Lithography
Extreme Ultraviolet Lithography (EUVL) is the next step for optical lithography moving toward shorter wavelengths. EUVL is a leading technology for device fabrication with feature sizes of 70 nm and below, and is being developed in the U.S., Japan and Europe. The implementation of EUV requires new technologies in sources, optics and resists materials, different from those of the more traditional optical techniques. The course introduces EUVL and the status of developments in the US and worldwide. It focuses on practical issues associated with the design and use of an EUVL stepper. The instructors address the details of the materials and optics, discuss the image formation process, the resist properties, mask design and fabrication, and the current design of lithographic tools.
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top