Prof. David T. Attwood
Professor in Residence at Univ of California Berkeley
SPIE Involvement:
Author | Instructor
Publications (32)

Proceedings Article | 28 April 2020 Open Access Presentation
Proceedings Volume 11323, 113232O (2020)

Proceedings Article | 6 October 2011 Paper
Proceedings Volume 8140, 81400W (2011)
KEYWORDS: Microscopes, X-rays, Imaging systems, Spatial resolution, X-ray lasers, Diffraction gratings, Image resolution, Modulation transfer functions, Diffraction, Gas lasers

Proceedings Article | 29 September 2009 Paper
Proceedings Volume 7451, 74510I (2009)
KEYWORDS: Microscopes, Zone plates, Extreme ultraviolet lithography, Objectives, Photomasks, Spatial resolution, X-ray lasers, Microscopy, Modulation, Modulation transfer functions

Proceedings Article | 18 March 2009 Paper
F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, W. Chao, E. Anderson, Y. Liu, K. Goldberg, P. Naulleau, P. Wachulak, M. Marconi, D. Attwood, J. Rocca, C. Menoni
Proceedings Volume 7271, 72713F (2009)
KEYWORDS: Microscopes, Spatial resolution, Extreme ultraviolet lithography, Zone plates, Photomasks, Extreme ultraviolet, Image resolution, Inspection, Objectives, Modulation transfer functions

Proceedings Article | 12 October 2007 Paper
Proceedings Volume 6702, 67020L (2007)
KEYWORDS: Laser ablation, X-ray lasers, Zone plates, Polymethylmethacrylate, Diffraction, Signal attenuation, Silver, Laser induced breakdown spectroscopy, Spectroscopy, Atomic force microscopy

Showing 5 of 32 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Emerging Lithographic Technologies XII
26 February 2008 | San Jose, California, United States
Emerging Lithographic Technologies XI
27 February 2007 | San Jose, California, United States
Emerging Lithographic Technologies X
21 February 2006 | San Jose, California, United States
Showing 5 of 9 Conference Committees
Course Instructor
SC123: Introduction to Extreme Ultraviolet Lithography
Extreme Ultraviolet Lithography (EUVL) is the next step for optical lithography moving toward shorter wavelengths. EUVL is a leading technology for device fabrication with feature sizes of 70 nm and below, and is being developed in the U.S., Japan and Europe. The implementation of EUV requires new technologies in sources, optics and resists materials, different from those of the more traditional optical techniques. The course introduces EUVL and the status of developments in the US and worldwide. It focuses on practical issues associated with the design and use of an EUVL stepper. The instructors address the details of the materials and optics, discuss the image formation process, the resist properties, mask design and fabrication, and the current design of lithographic tools.
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