Prof. David T. Attwood Profile

Prof. David T. Attwood

Professor in Residence at Univ of California Berkeley

SPIE Involvement:

Conference Program Committee | Author | Instructor

Publications (31)

PROCEEDINGS ARTICLE | October 6, 2011

Assessment of illumination characteristics of soft x-ray laser-based full-field microscopes

Proc. SPIE. 8140, X-ray Lasers and Coherent X-ray Sources: Development and Applications IX

KEYWORDS: Microscopes, Diffraction, Imaging systems, X-rays, Image resolution, Gas lasers, Modulation transfer functions, Spatial resolution, X-ray lasers, Diffraction gratings

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PROCEEDINGS ARTICLE | September 29, 2009

Advances in full field microscopy with table-top soft x-ray lasers

Proc. SPIE. 7451, Soft X-Ray Lasers and Applications VIII

KEYWORDS: Microscopes, Modulation, Microscopy, Objectives, Photomasks, Extreme ultraviolet lithography, Modulation transfer functions, Spatial resolution, X-ray lasers, Zone plates

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PROCEEDINGS ARTICLE | March 18, 2009

Inspection 13.2-nm table-top full-field microscope

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Microscopes, Inspection, Image resolution, Objectives, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Modulation transfer functions, Spatial resolution, Zone plates

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PROCEEDINGS ARTICLE | October 12, 2007

High spatial resolution full-field microscopy using a desktop-size soft x-ray laser

Proc. SPIE. 6702, Soft X-Ray Lasers and Applications VII

KEYWORDS: Microscopes, Capillaries, Image processing, Microscopy, Silicon, Objectives, Charge-coupled devices, Spatial resolution, X-ray lasers, Zone plates

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PROCEEDINGS ARTICLE | October 12, 2007

Nanoscale ablation with soft x-ray lasers

Proc. SPIE. 6702, Soft X-Ray Lasers and Applications VII

KEYWORDS: Diffraction, Polymethylmethacrylate, Signal attenuation, Spectroscopy, Silver, Atomic force microscopy, Laser ablation, Laser induced breakdown spectroscopy, X-ray lasers, Zone plates

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PROCEEDINGS ARTICLE | March 23, 2006

EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Microscopes, Imaging systems, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Spatial resolution, Zone plates, Plasma

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PROCEEDINGS ARTICLE | January 23, 2006

New nanofabrication technique using overlay for 15-nm zone plate

Proc. SPIE. 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV

KEYWORDS: Fabrication, Electron beam lithography, Diffraction, X-rays, X-ray microscopy, Spatial resolution, Zone plates, X-ray imaging, Nanofabrication, Overlay metrology

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PROCEEDINGS ARTICLE | September 14, 2005

Nanometer-scale imaging with compact soft x-ray lasers

Proc. SPIE. 5919, Soft X-Ray Lasers and Applications VI

KEYWORDS: Microscopes, Modulation, Imaging systems, Capillaries, X-rays, Image resolution, Objectives, Spatial resolution, X-ray lasers, Zone plates

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PROCEEDINGS ARTICLE | May 10, 2005

Nano-imaging with compact extreme ultraviolet laser sources

Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX

KEYWORDS: Laser sources, Microscopes, Imaging systems, Silicon, Reflectivity, Image resolution, Objectives, Extreme ultraviolet, Spatial resolution, Zone plates

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PROCEEDINGS ARTICLE | November 10, 2004

High-resolution imaging system using a tabletop extreme ultraviolet source

Proc. SPIE. 5534, Fourth Generation X-Ray Sources and Optics II

KEYWORDS: Microscopes, Mirrors, Light sources, Waveguides, Imaging systems, Microscopy, Plasmas, Image resolution, Extreme ultraviolet, High harmonic generation

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PROCEEDINGS ARTICLE | October 14, 2004

Direct index of refraction measurement of silicon and ruthenium at EUV wavelengths

Proc. SPIE. 5538, Optical Constants of Materials for UV to X-Ray Wavelengths

KEYWORDS: Scattering, Argon, Chemical species, Silicon, Interferometry, Refraction, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Absorption

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PROCEEDINGS ARTICLE | July 1, 2002

Lithographic evaluation of the EUV engineering test stand

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Lithography, Point spread functions, Reticles, Image resolution, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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PROCEEDINGS ARTICLE | July 1, 2002

Static microfield printing at the advanced light source with the ETS Set-2 optic

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Lithography, Mirrors, Reticles, Interferometry, Wavefronts, Printing, Extreme ultraviolet, Modulation transfer functions, Critical dimension metrology, Fiber optic illuminators

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PROCEEDINGS ARTICLE | July 1, 2002

Performance upgrades in the EUV engineering test stand

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Lithography, Reticles, Sensors, Wavefronts, Printing, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Fiber optic illuminators

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PROCEEDINGS ARTICLE | December 20, 2001

Initial results from the EUV engineering test stand

Proc. SPIE. 4506, Soft X-Ray and EUV Imaging Systems II

KEYWORDS: Lithography, Monochromatic aberrations, Mirrors, Reticles, Sensors, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

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PROCEEDINGS ARTICLE | December 13, 2001

Experimental analysis of high-resolution soft x-ray microscopy

Proc. SPIE. 4499, X-Ray Micro- and Nano-Focusing: Applications and Techniques II

KEYWORDS: Gold, Microscopes, Mirrors, X-rays, Nickel, Silicon, Scanning electron microscopy, Zone plates, Plating, X-ray imaging

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The soft x-ray, full-field microscope XM-1 at Lawrence Berkeley National Laboratory's (LBNL) Advanced Light Source has already demonstrated its capability to resolve 25-nm features. The soft x-ray, full-field microscope XM-1 at Lawrence Berkeley National Laboratory's (LBNL) Advanced Light Source has already demonstrated its capability to resolve 25-nm features. This was accomplished using a micro zone plate (MZP) with an outer zone width of 25 nm. Limited by the aspect ratio of the resist used in the fabrication, the gold-plating thickness of that zone plate is around 40 nm. However, some applications, in particular, biological imaging, prefer improved efficiency, which can be achieved by high-aspect-ratio zone plates. We accomplish this by using a bilayer-resist process in the zone plate fabrication. As our first attempt, a 40-nm-outer-zone-width MZP with a nickel-plating thickness of 150 nm (aspect ratio of 4:1) was successfully fabricated. Relative to the 25-nm MZP, this zone plate is ten times more efficient. Using this high-efficiency MZP, a line test pattern with half period of 30 nm is resolved by the microscope at photon energy of 500 eV. Furthermore, with a new multilayer mirror, the XM-1 can now perform imaging up to 1.8 keV. An image of a line test pattern with half period of 40 nm has a measured modulation of 90%. The image was taken at 1.77 keV with the high-efficiency MZP with an outer zone width of 35 nm and a nickel-plating thickness of 180 nm (aspect ratio of 5:1). XM-1 provides a gateway to high-resolution imaging at high energy. To measure frequency response of the XM-1, a partially annealed gold island pattern was chosen as a test object. After comparison with the SEM image of the pattern, the microscope has the measured cutoff of 19 nm, close to the theoretical one of 17 nm. The normalized frequency response, which is the ratio of the power density of the soft x-ray image to that of the SEM image, is shown in this paper.

PROCEEDINGS ARTICLE | December 12, 2001

Focusability of a capillary discharge-pumped soft x-ray laser beam

Proc. SPIE. 4505, Soft X-Ray Lasers and Applications IV

KEYWORDS: Mirrors, Sensors, Capillaries, X-rays, Plasmas, Wavefronts, Optical testing, Spatial coherence, X-ray lasers, Spherical lenses

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PROCEEDINGS ARTICLE | August 20, 2001

Equivalent multilayer bandwidth and comparison between 13.4 nm and 14.4 nm for EUV throughput calculation

Proc. SPIE. 4343, Emerging Lithographic Technologies V

KEYWORDS: Oxides, Mirrors, Photons, Interfaces, Reflectivity, Integration, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Chaos

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PROCEEDINGS ARTICLE | August 20, 2001

System integration and performance of the EUV engineering test stand

Proc. SPIE. 4343, Emerging Lithographic Technologies V

KEYWORDS: Mirrors, Multilayers, Reticles, Sensors, Xenon, Projection systems, Extreme ultraviolet, Optical alignment, Semiconducting wafers, Fiber optic illuminators

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PROCEEDINGS ARTICLE | November 8, 2000

XM-1: the high-resolution soft x-ray microscope at the Advanced Light Source

Proc. SPIE. 4146, Soft X-Ray and EUV Imaging Systems

KEYWORDS: Gold, Microscopes, Imaging systems, X-rays, Silver, Magnetism, Spectral resolution, Zone plates, X-ray imaging, Absorption

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PROCEEDINGS ARTICLE | November 8, 2000

High-resolution soft x-ray microscopy

Proc. SPIE. 4146, Soft X-Ray and EUV Imaging Systems

KEYWORDS: Microscopes, Mirrors, Lenses, X-rays, X-ray microscopy, Scanning electron microscopy, Objectives, Zone plates, X-ray imaging, Nanofabrication

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PROCEEDINGS ARTICLE | November 23, 1999

Recent advances in EUV phase-shifting point diffraction interferometry

Proc. SPIE. 3767, EUV, X-Ray, and Neutron Optics and Sources

KEYWORDS: Lithography, Diffraction, Interferometers, Cameras, Interferometry, Wavefronts, Optical testing, Extreme ultraviolet, EUV optics, Phase shifts

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PROCEEDINGS ARTICLE | June 5, 1998

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

Proc. SPIE. 3331, Emerging Lithographic Technologies II

KEYWORDS: Diffraction, Monochromatic aberrations, Interferometers, Sensors, Interferometry, Wavefronts, Optical testing, Photomasks, Extreme ultraviolet, Spherical lenses

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PROCEEDINGS ARTICLE | July 7, 1997

Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

Proc. SPIE. 3048, Emerging Lithographic Technologies

KEYWORDS: Diffraction, Mirrors, Interferometry, Wavefronts, Optical testing, Objectives, Extreme ultraviolet, EUV optics, Phase shifts, Diffraction gratings

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PROCEEDINGS ARTICLE | November 21, 1996

High flux undulator beamline optics for EUV interferometry and photoemission microscopy

Proc. SPIE. 2855, High Heat Flux Engineering III

KEYWORDS: Thermography, Mirrors, Microscopy, Crystals, Silicon, Interferometry, Finite element methods, Extreme ultraviolet, Monochromators, EUV optics

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PROCEEDINGS ARTICLE | September 25, 1995

White-light spacial frequency multiplication using soft xrays

Proc. SPIE. 2516, X-Ray Microbeam Technology and Applications

KEYWORDS: Electron beam lithography, Diffraction, Beam splitters, Light sources, Spatial frequencies, Interferometers, X-rays, Photoresist materials, Synchrotrons, Diffraction gratings

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PROCEEDINGS ARTICLE | May 19, 1995

At-wavelength testing of optics for EUV

Proc. SPIE. 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V

KEYWORDS: Optical components, Diffraction, Fringe analysis, Interferometers, Wavefronts, Optical testing, Photomasks, Extreme ultraviolet, Zone plates, EUV optics

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PROCEEDINGS ARTICLE | June 24, 1993

Effects of absorber topography and multilayer coating defects on reflective masks for soft x-ray/EUV projection lithography

Proc. SPIE. 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III

KEYWORDS: Gold, Carbon, Multilayers, Optical lithography, Germanium, Coating, Reflectivity, Photomasks, Projection lithography, Radio propagation

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PROCEEDINGS ARTICLE | January 13, 1993

Application of x rays to the analysis of DNA packaging in mammalian sperm

Proc. SPIE. 1741, Soft X-Ray Microscopy

KEYWORDS: Gold, Microscopes, Particles, Molecules, X-rays, X-ray microscopy, Atomic force microscopy, X-ray lasers, Zone plates, X-ray imaging

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PROCEEDINGS ARTICLE | January 13, 1993

X-ray microscopy resource center at the advanced light source

Proc. SPIE. 1741, Soft X-Ray Microscopy

KEYWORDS: Microscopes, Mirrors, Visible radiation, Light sources, X-rays, X-ray microscopy, Image resolution, Zone plates, Monochromators, X-ray imaging

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PROCEEDINGS ARTICLE | January 13, 1993

Imaging microscopy with x-ray lasers at LLNL

Proc. SPIE. 1741, Soft X-Ray Microscopy

KEYWORDS: Gold, Microscopes, Mirrors, X-ray optics, Microscopy, X-rays, X-ray microscopy, X-ray lasers, Zone plates, X-ray imaging

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Showing 5 of 31 publications

Conference Committee Involvement (9)

Extreme Ultraviolet (EUV) Lithography

22 February 2010 | San Jose, California, United States

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Emerging Lithographic Technologies XII

26 February 2008 | San Jose, California, United States

Emerging Lithographic Technologies XI

27 February 2007 | San Jose, California, United States

Emerging Lithographic Technologies X

21 February 2006 | San Jose, California, United States

Showing 5 of 9 published special sections

Course Instructor

SC123: Introduction to Extreme Ultraviolet Lithography

Extreme Ultraviolet Lithography (EUVL) is the next step for optical lithography moving toward shorter wavelengths. EUVL is a leading technology for device fabrication with feature sizes of 70 nm and below, and is being developed in the U.S., Japan and Europe. The implementation of EUV requires new technologies in sources, optics and resists materials, different from those of the more traditional optical techniques. The course introduces EUVL and the status of developments in the US and worldwide. It focuses on practical issues associated with the design and use of an EUVL stepper. The instructors address the details of the materials and optics, discuss the image formation process, the resist properties, mask design and fabrication, and the current design of lithographic tools.

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