David C. Brandt
Senior Director EUV Marketing at ASML US
SPIE Involvement:
Author
Publications (34)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet, High volume manufacturing

PROCEEDINGS ARTICLE | May 10, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scanners, Reflectivity, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, EUV optics, Plasma, Tin

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Current controlled current source

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Scanners, Manufacturing, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Logic devices, Semiconducting wafers, Overlay metrology, Tin, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Optical lithography, Laser development, Carbon dioxide lasers, Computer simulations, Monte Carlo methods, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Plasma physics, Pulsed laser operation, Performance modeling, Plasma, Liquids, Tin, Absorption

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Laser energy, High power lasers, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Pulsed laser operation, Plasma, Tin

Showing 5 of 34 publications
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