Dr. David W. Brinkley
at RAVE LLC
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, FT-IR spectroscopy, Contamination, Air contamination, Ions, Pellicles, Photomasks, Fluorine, Semiconducting wafers, Adhesives

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Mathematical modeling, Nanotechnology, Metrology, Contamination, Nanoparticles, Particles, Inspection, Atomic force microscopy, Photomasks, Defect inspection

Proceedings Article | 17 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Quartz, Air contamination, Image processing, Particles, Inspection, Pellicles, Photomasks, Semiconducting wafers

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reticles, Opacity, Manufacturing, Atomic force microscopy, Photomasks, Source mask optimization, Computational lithography, Optimization (mathematics), Resolution enhancement technologies

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Nanotechnology, Lithography, Data modeling, Nanoparticles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Autoregressive models, Cryogenics

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top