Dr. David Y. Chan
Member/Technical Staff at SUNY Poly SEMATECH
SPIE Involvement:
Publications (23)

Proceedings Article | 16 April 2012 Open Access Paper
Proceedings Volume 8352, 835203 (2012) https://doi.org/10.1117/12.923746
KEYWORDS: Photomasks, Binary data, Phase shifts, Data processing, Optical proximity correction, Microelectronics, Databases, Neodymium, Lithography, Pellicles

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 81660D (2011) https://doi.org/10.1117/12.897308
KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Photomask technology, Glasses, Data processing, Inspection, Data conversion, Microelectronics

Proceedings Article | 2 April 2011 Paper
Proceedings Volume 7985, 79850A (2011) https://doi.org/10.1117/12.896913
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Defect inspection, Particles, Extreme ultraviolet lithography, Electromagnetic coupling, Reflectivity, Reticles, Semiconducting wafers

Proceedings Article | 17 March 2011 Paper
Proceedings Volume 7985, 798502 (2011) https://doi.org/10.1117/12.896880
KEYWORDS: Photomasks, Pellicles, Binary data, Optical proximity correction, Data processing, Manufacturing, Phase shifts, Microelectronics, Glasses, Printing

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782303 (2010) https://doi.org/10.1117/12.868465
KEYWORDS: Photomasks, Microelectronics, Data processing, Photomask technology, Current controlled current source, Semiconductors

Showing 5 of 23 publications
Conference Committee Involvement (2)
Photomask Technology
13 September 2010 | Monterey, California, United States
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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