David R. Cho
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Publications (5)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Neodymium, Photoresist processing, Binary data

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Reticles, Contamination, Defect detection, Air contamination, Particles, Inspection, Image analysis, Photomasks, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Optical filters, Reticles, Metrology, Image processing, Scanners, Image quality, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Computational modeling, Calibration, Wavefronts, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Optical lithography, Data modeling, Modulation, Polymers, Image processing, Diffusion, Manufacturing, Critical dimension metrology, Photoresist processing

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