David A. Crow
Technology Development Engineering
SPIE Involvement:
Conference Program Committee | Author
Publications (7)

Proceedings Article | 29 April 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconductors, Lithography, Manufacturing, Control systems, Nomenclature, Process control, Information technology, System integration, Semiconducting wafers, Overlay metrology

Proceedings Article | 29 April 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconductors, Metrology, Data modeling, Phase modulation, Manufacturing, Control systems, Process control, Feedback control, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 July 2003
Proc. SPIE. 5044, Advanced Process Control and Automation
KEYWORDS: Metrology, Data modeling, Error analysis, Silicon, Manufacturing, Control systems, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 July 2003
Proc. SPIE. 5044, Advanced Process Control and Automation
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Manufacturing, Control systems, Data processing, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconductors, Reticles, Metrology, Control systems, Photomasks, Optical alignment, Feedback control, Semiconducting wafers, Overlay metrology, Device simulation

Showing 5 of 7 publications
Conference Committee Involvement (1)
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
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