Dr. David L. DeMaris
at IBM - Austin EDA
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Surface plasmons, Optical lithography, Data modeling, Calibration, Image processing, Printing, Image quality, Optical proximity correction, Statistical modeling, Process modeling

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Detection and tracking algorithms, Chemical species, Printing, Associative arrays, Image classification, Reconstruction algorithms, Field emission displays, Binary data

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Spatial frequencies, Metals, Image quality, Source mask optimization, Optical proximity correction, SRAF, Modulation transfer functions, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Diffraction, Visualization, Photomasks, Source mask optimization, Algorithm development, Standards development, Resolution enhancement technologies

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