Dr. David Fryer
Product Engineer at Mentor Graphics
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Refractive index, Data modeling, Calibration, Monte Carlo methods, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Data modeling, Calibration, 3D modeling, Optical proximity correction, Bayesian inference

SPIE Journal Paper | February 16, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Mathematical modeling, Data modeling, Visualization, Calibration, Photoresist materials, Optical proximity correction, Stochastic processes, Statistical modeling, Systems modeling, Process modeling

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Data transmission, 3D modeling, Image quality, Near field, Photomasks, Critical dimension metrology, Semiconducting wafers, Electromagnetism

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling

Showing 5 of 10 publications
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