Dr. David S. Fryer
Product Engineer at Mentor Graphics
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 20 October 2016 Paper
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Refractive index, Data modeling, Calibration, Monte Carlo methods, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Data modeling, Calibration, 3D modeling, Optical proximity correction, Bayesian inference

SPIE Journal Paper | 16 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Data transmission, 3D modeling, Image quality, Near field, Photomasks, Critical dimension metrology, Semiconducting wafers, Electromagnetism

Showing 5 of 17 publications
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