Dr. David Gready
Research Scientist at KLA Oregon
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Optical design, Light sources, Metrology, Polarization, Inspection, Reflectivity, Interference (communication), Scatterometry, Semiconducting wafers, Electromagnetic simulation, Overlay metrology, Device simulation

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Image processing, Optical testing, Scatterometry, Optical metrology, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Wafer testing, Overlay metrology, Device simulation, Diffraction gratings

Proceedings Article | 10 April 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Diffraction, Metrology, Image processing, Scanning electron microscopy, Scatterometry, Uncertainty analysis, Critical dimension metrology, Performance modeling, Overlay metrology, Diffraction gratings

Proceedings Article | 17 February 2011 Paper
Proc. SPIE. 7953, Novel In-Plane Semiconductor Lasers X
KEYWORDS: Lithography, Electron beam lithography, Optical design, Quantum wells, Modulation, Etching, Laser development, Phase shift keying, Semiconductor lasers, Nanoimprint lithography

Proceedings Article | 17 February 2011 Paper
Proc. SPIE. 7953, Novel In-Plane Semiconductor Lasers X
KEYWORDS: Refractive index, Modulation, Waveguides, Cladding, Etching, Laser development, Resistance, Phase shift keying, Scanning electron microscopy, Distributed Bragg reflectors

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