David Herisson
at STMicroelectronics
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | July 15, 2003
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Modeling, Thin films, Refractive index, Spectroscopy, Ultraviolet radiation, Error analysis, Silicon, Scatterometry, Laser induced breakdown spectroscopy, Critical dimension metrology

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Scanners, Chemistry, Photomasks, CMOS technology, Optical alignment, Semiconducting wafers

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Reticles, Metrology, Silicon, Coating, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Metrology, Electron microscopes, Scanning electron microscopy, Scatterometry, Process control, Spectroscopic ellipsometry, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

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