Mr. David H. Kim
Product Solution Sales Manager at Synopsys Korea Inc
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Logic, Optical lithography, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Nano opto mechanical systems, Image processing, Image quality, Design for manufacturing, Image enhancement, Optical proximity correction, Nanoimprint lithography, Neodymium, Optimization (mathematics), Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Defect detection, Calibration, Image processing, Inspection, Image analysis, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Computational lithography

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Detection and tracking algorithms, Electroluminescence, Photomasks, Source mask optimization, Optical proximity correction, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Optical lithography, Image processing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Data modeling, Calibration, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 24 publications
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