Dr. David R. Medeiros
at IBM Corp
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Printing, Photomasks, Double patterning technology, Immersion lithography, Optical proximity correction

Proceedings Article | 26 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Etching, Metals, Scanners, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Polymers, Interfaces, Silicon, Reflectivity, Photoresist materials, Semiconducting wafers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Polymers, Silicon, Reflectivity, Photoresist materials, Silicon films, Reactive ion etching

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Infrared imaging, Lithography, Polymers, Diffusion, Image resolution, Photoresist materials, Humidity, Extreme ultraviolet lithography, Photoresist processing, Absorption

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Oxides, Lithography, Etching, Polymers, Resistance, Printing, Fluorine, Photoresist processing, Standards development, 193nm lithography

Showing 5 of 32 publications
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